For a p channel MOSFET which of the following is not true?a)The source...
The induced channel is a p-type region induced by applying a positive potential to the gate.
In a p-channel MOSFET (Metal-Oxide-Semiconductor Field-Effect Transistor), the characteristics and behavior are slightly different from those of an n-channel MOSFET. In a p-channel MOSFET, the following statements are true:
A: The source and drain are p-type semiconductors: In a p-channel MOSFET, both the source and drain regions are doped with p-type semiconductor material.
B: The induced channel is not a p-type region induced by applying a positive potential to the gate: In a p-channel MOSFET, a negative potential is applied to the gate to create an electric field that attracts positively charged carriers (holes) towards the surface, forming a channel. The induced channel is an n-type region, not a p-type region.
C: The substrate is an n-type semiconductor: In a p-channel MOSFET, the substrate is typically an n-type semiconductor material.
Therefore, the statement that is not true for a p-channel MOSFET is B: The induced channel is a p-type region induced by applying a positive potential to the gate.