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Test: Design Processes - Electrical Engineering (EE) MCQ


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10 Questions MCQ Test - Test: Design Processes

Test: Design Processes for Electrical Engineering (EE) 2024 is part of Electrical Engineering (EE) preparation. The Test: Design Processes questions and answers have been prepared according to the Electrical Engineering (EE) exam syllabus.The Test: Design Processes MCQs are made for Electrical Engineering (EE) 2024 Exam. Find important definitions, questions, notes, meanings, examples, exercises, MCQs and online tests for Test: Design Processes below.
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Test: Design Processes - Question 1

Micropocessor has ____ major architectural blocks

Detailed Solution for Test: Design Processes - Question 1

MIcropocessor has four major architectural blocks – ALU, control unit, I/O unit and memory.

Test: Design Processes - Question 2

High level of system integration, _____ interconnections

Detailed Solution for Test: Design Processes - Question 2

High level of system integration usually greatly reduces interconnections which is a weak spot in any system.

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Test: Design Processes - Question 3

Some important features of system are

Detailed Solution for Test: Design Processes - Question 3

Lower power dissipation, lower weight, lower volume are some of the important features of system.

Test: Design Processes - Question 4

 Performance is better if power speed product is

Detailed Solution for Test: Design Processes - Question 4

 Performance is better if power speed product is high. Performance is analysed using this speed power product.

Test: Design Processes - Question 5

VLSI design is done in ____ approach

Detailed Solution for Test: Design Processes - Question 5

VLSI design is done in top-down manner with adequate computer aided tools to do the job. Partitioning, generating or building and verification is done.

Test: Design Processes - Question 6

 Components operating in high frequency should be

Detailed Solution for Test: Design Processes - Question 6

Components operating in high frequency should be at physically proximate, since one may pay severe penalties for long, high bandwidth interconnects.

Test: Design Processes - Question 7

 Approach used for design process are

Detailed Solution for Test: Design Processes - Question 7

Several approaches used for design process are conventional circuit symbols, logic symbols, stick diagrams, mask layouts, architectural block diagrams and floor plans.

Test: Design Processes - Question 8

Which approach is used to show the relative disposition of subunits?

Detailed Solution for Test: Design Processes - Question 8

Floor plan is used to show the planned relative disposition of the subunits on the chip and thus on mask layouts.

Test: Design Processes - Question 9

When a polysilicon crosses a diffusion _____ will be formed

Detailed Solution for Test: Design Processes - Question 9

When and where ever the polysilicon crosses the diffusion, transistor will be formed.

Test: Design Processes - Question 10

Two metal layers can be joined by using

Detailed Solution for Test: Design Processes - Question 10

The first metal layer can be joined with the second one using via. Via is an electrical connection between layers in a physical electronic circuit.

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