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Silicon oxide is patterned on a substrate using:
- a)Physical lithography
- b)Photolithography
- c)Chemical lithography
- d)Mechanical lithography
Correct answer is option 'B'. Can you explain this answer?
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Silicon oxide is patterned on a substrate using:a)Physical lithography...
Silicon oxide is patterned on a substrate using Photolithography.
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Silicon oxide is patterned on a substrate using:a)Physical lithography...
Photolithography
Photolithography is the process used to pattern silicon oxide on a substrate. This technique involves using light to transfer a geometric pattern from a photomask to a light-sensitive chemical photoresist on the substrate.
Steps in Photolithography process:
- Photoresist coating: A thin layer of photoresist is spin-coated onto the substrate.
- Soft bake: The substrate is heated to remove any solvent from the photoresist, making it more stable.
- Alignment and exposure: The substrate is aligned with a photomask containing the desired pattern, and then exposed to UV light.
- Development: The exposed photoresist is developed using a specific chemical solution, which removes the unexposed regions, leaving behind the pattern.
- Etching: The patterned photoresist acts as a mask for etching the silicon oxide on the substrate.
- Photoresist removal: The remaining photoresist is stripped away, leaving behind the patterned silicon oxide on the substrate.
Advantages of Photolithography:
- High resolution: Photolithography can achieve very fine feature sizes.
- Scalability: It is a highly scalable process suitable for mass production.
- Cost-effective: Photolithography is a cost-effective method for patterning substrates.
In conclusion, photolithography is the preferred method for patterning silicon oxide on a substrate due to its high resolution, scalability, and cost-effectiveness.
Photolithography is the process used to pattern silicon oxide on a substrate. This technique involves using light to transfer a geometric pattern from a photomask to a light-sensitive chemical photoresist on the substrate.
Steps in Photolithography process:
- Photoresist coating: A thin layer of photoresist is spin-coated onto the substrate.
- Soft bake: The substrate is heated to remove any solvent from the photoresist, making it more stable.
- Alignment and exposure: The substrate is aligned with a photomask containing the desired pattern, and then exposed to UV light.
- Development: The exposed photoresist is developed using a specific chemical solution, which removes the unexposed regions, leaving behind the pattern.
- Etching: The patterned photoresist acts as a mask for etching the silicon oxide on the substrate.
- Photoresist removal: The remaining photoresist is stripped away, leaving behind the patterned silicon oxide on the substrate.
Advantages of Photolithography:
- High resolution: Photolithography can achieve very fine feature sizes.
- Scalability: It is a highly scalable process suitable for mass production.
- Cost-effective: Photolithography is a cost-effective method for patterning substrates.
In conclusion, photolithography is the preferred method for patterning silicon oxide on a substrate due to its high resolution, scalability, and cost-effectiveness.
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Silicon oxide is patterned on a substrate using:a)Physical lithographyb)Photolithographyc)Chemical lithographyd)Mechanical lithographyCorrect answer is option 'B'. Can you explain this answer?
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Silicon oxide is patterned on a substrate using:a)Physical lithographyb)Photolithographyc)Chemical lithographyd)Mechanical lithographyCorrect answer is option 'B'. Can you explain this answer? for Electrical Engineering (EE) 2025 is part of Electrical Engineering (EE) preparation. The Question and answers have been prepared according to the Electrical Engineering (EE) exam syllabus. Information about Silicon oxide is patterned on a substrate using:a)Physical lithographyb)Photolithographyc)Chemical lithographyd)Mechanical lithographyCorrect answer is option 'B'. Can you explain this answer? covers all topics & solutions for Electrical Engineering (EE) 2025 Exam. Find important definitions, questions, meanings, examples, exercises and tests below for Silicon oxide is patterned on a substrate using:a)Physical lithographyb)Photolithographyc)Chemical lithographyd)Mechanical lithographyCorrect answer is option 'B'. Can you explain this answer?.
Silicon oxide is patterned on a substrate using:a)Physical lithographyb)Photolithographyc)Chemical lithographyd)Mechanical lithographyCorrect answer is option 'B'. Can you explain this answer? for Electrical Engineering (EE) 2025 is part of Electrical Engineering (EE) preparation. The Question and answers have been prepared according to the Electrical Engineering (EE) exam syllabus. Information about Silicon oxide is patterned on a substrate using:a)Physical lithographyb)Photolithographyc)Chemical lithographyd)Mechanical lithographyCorrect answer is option 'B'. Can you explain this answer? covers all topics & solutions for Electrical Engineering (EE) 2025 Exam. Find important definitions, questions, meanings, examples, exercises and tests below for Silicon oxide is patterned on a substrate using:a)Physical lithographyb)Photolithographyc)Chemical lithographyd)Mechanical lithographyCorrect answer is option 'B'. Can you explain this answer?.
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