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Heavily doped polysilicon is deposited using
- a)chemical vapour decomposition
- b)chemical vapour deposition
- c)chemical deposition
- d)dry deposition
Correct answer is option 'B'. Can you explain this answer?
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Verified Answer
Heavily doped polysilicon is deposited usinga)chemical vapour decompos...
The polysilicon layer consists of heavily doped polysilicon deposited by chemical vapour deposition.
Most Upvoted Answer
Heavily doped polysilicon is deposited usinga)chemical vapour decompos...
Chemical Vapour Deposition (CVD) for Heavily Doped Polysilicon Deposition
Explanation:
Chemical Vapour Deposition (CVD)
- Chemical Vapour Deposition (CVD) is a process used to deposit thin films of various materials onto a substrate.
- In CVD, the desired material is deposited from a gas phase onto a heated substrate, where chemical reactions take place to form the desired film.
Heavily Doped Polysilicon
- Heavily doped polysilicon is a material that has been doped with a high concentration of impurities to alter its electrical properties.
- This material is commonly used in the fabrication of semiconductor devices such as transistors and diodes.
Deposition of Heavily Doped Polysilicon
- When depositing heavily doped polysilicon using CVD, the process involves introducing a gas containing the dopant material into the CVD chamber along with the silicon precursor gas.
- The gases undergo chemical reactions at high temperatures, resulting in the deposition of heavily doped polysilicon onto the substrate.
Benefits of CVD for Heavily Doped Polysilicon Deposition
- CVD offers precise control over the deposition process, allowing for the uniform and controlled growth of heavily doped polysilicon films.
- It enables the deposition of thin films with high purity and excellent electrical properties, making it ideal for semiconductor device fabrication.
Conclusion
- In conclusion, heavily doped polysilicon is deposited using Chemical Vapour Deposition (CVD) due to its ability to provide precise control over the deposition process and produce high-quality films suitable for semiconductor applications.
Explanation:
Chemical Vapour Deposition (CVD)
- Chemical Vapour Deposition (CVD) is a process used to deposit thin films of various materials onto a substrate.
- In CVD, the desired material is deposited from a gas phase onto a heated substrate, where chemical reactions take place to form the desired film.
Heavily Doped Polysilicon
- Heavily doped polysilicon is a material that has been doped with a high concentration of impurities to alter its electrical properties.
- This material is commonly used in the fabrication of semiconductor devices such as transistors and diodes.
Deposition of Heavily Doped Polysilicon
- When depositing heavily doped polysilicon using CVD, the process involves introducing a gas containing the dopant material into the CVD chamber along with the silicon precursor gas.
- The gases undergo chemical reactions at high temperatures, resulting in the deposition of heavily doped polysilicon onto the substrate.
Benefits of CVD for Heavily Doped Polysilicon Deposition
- CVD offers precise control over the deposition process, allowing for the uniform and controlled growth of heavily doped polysilicon films.
- It enables the deposition of thin films with high purity and excellent electrical properties, making it ideal for semiconductor device fabrication.
Conclusion
- In conclusion, heavily doped polysilicon is deposited using Chemical Vapour Deposition (CVD) due to its ability to provide precise control over the deposition process and produce high-quality films suitable for semiconductor applications.
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Heavily doped polysilicon is deposited usinga)chemical vapour decompositionb)chemical vapour depositionc)chemical depositiond)dry depositionCorrect answer is option 'B'. Can you explain this answer?
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Heavily doped polysilicon is deposited usinga)chemical vapour decompositionb)chemical vapour depositionc)chemical depositiond)dry depositionCorrect answer is option 'B'. Can you explain this answer? for Electrical Engineering (EE) 2024 is part of Electrical Engineering (EE) preparation. The Question and answers have been prepared according to the Electrical Engineering (EE) exam syllabus. Information about Heavily doped polysilicon is deposited usinga)chemical vapour decompositionb)chemical vapour depositionc)chemical depositiond)dry depositionCorrect answer is option 'B'. Can you explain this answer? covers all topics & solutions for Electrical Engineering (EE) 2024 Exam. Find important definitions, questions, meanings, examples, exercises and tests below for Heavily doped polysilicon is deposited usinga)chemical vapour decompositionb)chemical vapour depositionc)chemical depositiond)dry depositionCorrect answer is option 'B'. Can you explain this answer?.
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