Elemental Semiconductor
Silicon is an elemental semiconductor, meaning it is made up of a single element - silicon. Elemental semiconductors are materials that have properties between those of conductors and insulators. They have a moderate electrical conductivity at room temperature, but their conductivity can be increased by adding impurities or altering their structure.

Availability of Nature Oxide SiO2
One of the main reasons why silicon has a preference in IC (Integrated Circuit) technology is because of the availability of its natural oxide, SiO2. Silicon dioxide (SiO2) is a compound made up of silicon and oxygen atoms. It is commonly found in nature as quartz or sand.

Insulating Properties of SiO2
SiO2 has excellent insulating properties, making it an ideal material for creating a thin layer of insulation between different components and layers in an integrated circuit. This thin layer is referred to as the gate oxide in MOS (Metal-Oxide-Semiconductor) technology.

Gate Oxide in MOS Technology
In MOS technology, the gate oxide plays a crucial role in controlling the flow of electric current within the integrated circuit. It acts as an insulator between the gate terminal and the channel region, allowing the gate terminal to control the conductivity of the channel.

Advantages of SiO2 as a Gate Oxide
There are several advantages of using SiO2 as a gate oxide in IC technology:

1. High Dielectric Strength: SiO2 has a high dielectric strength, which means it can withstand high voltages without breaking down. This is essential for ensuring the reliability and longevity of integrated circuits.

2. Excellent Thermal Stability: SiO2 has excellent thermal stability, meaning it can withstand high temperatures without degrading or losing its insulating properties. This is important during the fabrication process, which involves several high-temperature steps.

3. Compatibility with Silicon: SiO2 is chemically compatible with silicon, allowing for the formation of a stable interface between the gate oxide and the silicon substrate. This interface is crucial for the proper functioning of MOS transistors.

4. Low Leakage Current: SiO2 has a low leakage current, which means it does not allow significant amounts of current to flow through it when it is in the insulating state. This helps in reducing power consumption and improving the overall performance of integrated circuits.

In conclusion, the availability of silicon dioxide (SiO2) as a natural oxide and its favorable properties, such as high dielectric strength, excellent thermal stability, compatibility with silicon, and low leakage current, make silicon the preferred choice for IC technology.