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Consider a silicon sample at T = 300 K, with a uniform donor density Nd = 5x1016 cm-3illuminated uniformly such that the optical generation rate is Gopt = 1.5 x1020 cm-3s-1 through outthe sample. The incident radiation is turned off at t = 0. Assume low-level injection to be valid andignore surface effects. The carrier lifetimes are po = 0.1 and no = 0.5 ?s.The hole concentration at t = 0 and the hole concentration at t = 0.3 μs, respectively, area)1.5x 1013 cm-3 and 7.47 x1011 cm-3b)1.5x 1013 cm-3 and 8.23x1011 cm-3c)7.5x 1013 cm-3 and 3.73x1011 cm-3d)7.5x 1013 cm-3 and 4.12 x1011 cm-3Correct answer is option 'C'. Can you explain this answer? for GATE 2024 is part of GATE preparation. The Question and answers have been prepared
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the GATE exam syllabus. Information about Consider a silicon sample at T = 300 K, with a uniform donor density Nd = 5x1016 cm-3illuminated uniformly such that the optical generation rate is Gopt = 1.5 x1020 cm-3s-1 through outthe sample. The incident radiation is turned off at t = 0. Assume low-level injection to be valid andignore surface effects. The carrier lifetimes are po = 0.1 and no = 0.5 ?s.The hole concentration at t = 0 and the hole concentration at t = 0.3 μs, respectively, area)1.5x 1013 cm-3 and 7.47 x1011 cm-3b)1.5x 1013 cm-3 and 8.23x1011 cm-3c)7.5x 1013 cm-3 and 3.73x1011 cm-3d)7.5x 1013 cm-3 and 4.12 x1011 cm-3Correct answer is option 'C'. Can you explain this answer? covers all topics & solutions for GATE 2024 Exam.
Find important definitions, questions, meanings, examples, exercises and tests below for Consider a silicon sample at T = 300 K, with a uniform donor density Nd = 5x1016 cm-3illuminated uniformly such that the optical generation rate is Gopt = 1.5 x1020 cm-3s-1 through outthe sample. The incident radiation is turned off at t = 0. Assume low-level injection to be valid andignore surface effects. The carrier lifetimes are po = 0.1 and no = 0.5 ?s.The hole concentration at t = 0 and the hole concentration at t = 0.3 μs, respectively, area)1.5x 1013 cm-3 and 7.47 x1011 cm-3b)1.5x 1013 cm-3 and 8.23x1011 cm-3c)7.5x 1013 cm-3 and 3.73x1011 cm-3d)7.5x 1013 cm-3 and 4.12 x1011 cm-3Correct answer is option 'C'. Can you explain this answer?.
Solutions for Consider a silicon sample at T = 300 K, with a uniform donor density Nd = 5x1016 cm-3illuminated uniformly such that the optical generation rate is Gopt = 1.5 x1020 cm-3s-1 through outthe sample. The incident radiation is turned off at t = 0. Assume low-level injection to be valid andignore surface effects. The carrier lifetimes are po = 0.1 and no = 0.5 ?s.The hole concentration at t = 0 and the hole concentration at t = 0.3 μs, respectively, area)1.5x 1013 cm-3 and 7.47 x1011 cm-3b)1.5x 1013 cm-3 and 8.23x1011 cm-3c)7.5x 1013 cm-3 and 3.73x1011 cm-3d)7.5x 1013 cm-3 and 4.12 x1011 cm-3Correct answer is option 'C'. Can you explain this answer? in English & in Hindi are available as part of our courses for GATE.
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Here you can find the meaning of Consider a silicon sample at T = 300 K, with a uniform donor density Nd = 5x1016 cm-3illuminated uniformly such that the optical generation rate is Gopt = 1.5 x1020 cm-3s-1 through outthe sample. The incident radiation is turned off at t = 0. Assume low-level injection to be valid andignore surface effects. The carrier lifetimes are po = 0.1 and no = 0.5 ?s.The hole concentration at t = 0 and the hole concentration at t = 0.3 μs, respectively, area)1.5x 1013 cm-3 and 7.47 x1011 cm-3b)1.5x 1013 cm-3 and 8.23x1011 cm-3c)7.5x 1013 cm-3 and 3.73x1011 cm-3d)7.5x 1013 cm-3 and 4.12 x1011 cm-3Correct answer is option 'C'. Can you explain this answer? defined & explained in the simplest way possible. Besides giving the explanation of
Consider a silicon sample at T = 300 K, with a uniform donor density Nd = 5x1016 cm-3illuminated uniformly such that the optical generation rate is Gopt = 1.5 x1020 cm-3s-1 through outthe sample. The incident radiation is turned off at t = 0. Assume low-level injection to be valid andignore surface effects. The carrier lifetimes are po = 0.1 and no = 0.5 ?s.The hole concentration at t = 0 and the hole concentration at t = 0.3 μs, respectively, area)1.5x 1013 cm-3 and 7.47 x1011 cm-3b)1.5x 1013 cm-3 and 8.23x1011 cm-3c)7.5x 1013 cm-3 and 3.73x1011 cm-3d)7.5x 1013 cm-3 and 4.12 x1011 cm-3Correct answer is option 'C'. Can you explain this answer?, a detailed solution for Consider a silicon sample at T = 300 K, with a uniform donor density Nd = 5x1016 cm-3illuminated uniformly such that the optical generation rate is Gopt = 1.5 x1020 cm-3s-1 through outthe sample. The incident radiation is turned off at t = 0. Assume low-level injection to be valid andignore surface effects. The carrier lifetimes are po = 0.1 and no = 0.5 ?s.The hole concentration at t = 0 and the hole concentration at t = 0.3 μs, respectively, area)1.5x 1013 cm-3 and 7.47 x1011 cm-3b)1.5x 1013 cm-3 and 8.23x1011 cm-3c)7.5x 1013 cm-3 and 3.73x1011 cm-3d)7.5x 1013 cm-3 and 4.12 x1011 cm-3Correct answer is option 'C'. Can you explain this answer? has been provided alongside types of Consider a silicon sample at T = 300 K, with a uniform donor density Nd = 5x1016 cm-3illuminated uniformly such that the optical generation rate is Gopt = 1.5 x1020 cm-3s-1 through outthe sample. The incident radiation is turned off at t = 0. Assume low-level injection to be valid andignore surface effects. The carrier lifetimes are po = 0.1 and no = 0.5 ?s.The hole concentration at t = 0 and the hole concentration at t = 0.3 μs, respectively, area)1.5x 1013 cm-3 and 7.47 x1011 cm-3b)1.5x 1013 cm-3 and 8.23x1011 cm-3c)7.5x 1013 cm-3 and 3.73x1011 cm-3d)7.5x 1013 cm-3 and 4.12 x1011 cm-3Correct answer is option 'C'. Can you explain this answer? theory, EduRev gives you an
ample number of questions to practice Consider a silicon sample at T = 300 K, with a uniform donor density Nd = 5x1016 cm-3illuminated uniformly such that the optical generation rate is Gopt = 1.5 x1020 cm-3s-1 through outthe sample. The incident radiation is turned off at t = 0. Assume low-level injection to be valid andignore surface effects. The carrier lifetimes are po = 0.1 and no = 0.5 ?s.The hole concentration at t = 0 and the hole concentration at t = 0.3 μs, respectively, area)1.5x 1013 cm-3 and 7.47 x1011 cm-3b)1.5x 1013 cm-3 and 8.23x1011 cm-3c)7.5x 1013 cm-3 and 3.73x1011 cm-3d)7.5x 1013 cm-3 and 4.12 x1011 cm-3Correct answer is option 'C'. Can you explain this answer? tests, examples and also practice GATE tests.